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    Please use this identifier to cite or link to this item: http://ir.lib.ksu.edu.tw/handle/987654321/3783


    Title: Fluorine thermal stability of ZnO:F films investigated by thermal desorption spectroscopy
    Authors: ChangShang-Chou (張慎周)
    LinTien-Chai
    LiTo-Sing (李道聖)
    HuangTin-Wei
    Keywords: fluorine
    zinc oxide
    thermal desorption
    Date: 2009-02-26
    Issue Date: 2009-08-15 19:39:05 (UTC+8)
    Abstract: To estimate the fluorine thermal stability of fluorine doped zincoxide (ZnO:F) films, ZnO:F films were prepared by co-sputteringzinc oxide (ZnO) and magnesium fluoride (MgF2) targets underdifferent sputtering powers. The prepared films were tested with athermal desorption system heated from room temperature to 500oC.Four elements: zinc (Zn), oxygen (O), magnesium (Mg) and fluorine(F) from ZnO:F films exhibit clear and similar thermal desorptionbehavior. The result indicates prepared ZnO:F films will desorbcorresponding to low bound strength under 100oC heat treatment,and exhibit multilayer instead of layer by layer desorption behaviorbased on Polanyi-Wigner model.Fluorine is thermally unstable for ZnO:F films evidenced bythermal desorption test. Electrical and optical properties of ZnO:Ffilms after thermal desorption test become negative. This workcontributes to display or solar industry if ZnO:F films are consideredto be the transparent conductive oxide films.
    Relation: Electronic Materials and Packaging, 2008. EMAP 2008. International Conference on p.25-28 ,22-24 Oct. 2008
    Appears in Collections:[電機工程系所] 會議論文

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