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    Please use this identifier to cite or link to this item: http://ir.lib.ksu.edu.tw/handle/987654321/2640


    Title: Nanomechanical Characterization of Amorphous Hydrogenated Carbon Thin Films
    Authors: Te-Hua Fang
    Win-Jin Chang
    張文進
    Keywords: Nanoindentation
    Amorphous hydrogenated carbon films
    ECR-MPCVD
    Raman spectra
    AFM
    Date: 2006-09-23
    Issue Date: 2009-08-12 20:09:49 (UTC+8)
    Abstract: Amorphous hydrogenated carbon (a-C:H) thin films deposited on a silicon substrate under various mixtures of methane-hydrogen gas by electron cyclotron resonance microwave plasma chemical vapor deposition (ECR-MPCVD) was investigated. Microstructure, surface morphology and mechanical characterizations of the a-C:H films were analyzed using Raman spectroscopy, atomic force microscopy (AFM) and nanoindentation technique, respectively. The results indicated there was an increase of the hydrogen content, the ratio of the D-peak to the G-peak (ID/IG) increased but the surface roughness of the films was reduced. Both hardness and Young’s modulus increased as the hydrogen content was increased. In addition, the contact stress-strain analysis is reported. The results confirmed that the mechanical properties of the amorphous hydrogenated carbon thin films improved using a higher H2 content in the source gas.
    Relation: Applied Surface Science, v. 252, 2006, p. 6243-6248
    Appears in Collections:[Graduate School and Department of Mechhanical Engineering] Periodical Articles

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