Kun Shan University Institutional Repository:Item 987654321/17378
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    Please use this identifier to cite or link to this item: http://ir.lib.ksu.edu.tw/handle/987654321/17378

    Title: Electrical characteristics and inhomogeneous barrier analysis of Al/NPB/p-Si Schottky diodes
    Authors: 黃文昌
    Keywords: Schottky contact;Inhomogeneous barrier height;Series resistance
    Date: 2011-03
    Issue Date: 2012-09-07 11:02:01 (UTC+8)
    Abstract: The current–voltage–temperature (I–V–T) characteristics of Al/NPB/p-Si Schottky diodes were discussed in detail in this paper. It shows an abnormal decrease of the Schottky barrier height and increase of ideality factor as the decrease of measured temperature. The series resistance was evaluated and it is found that the series resistance increases as the increase of the measurement temperature. The Gauss distribution of the inhomogeneous of the barrier was brought to discuss the contact interface. The characteristics have been interpreted based on the thermionic emission (TE) mechanism with Gaussian distribution of the barrier heights of /b0 is 0.96 eV and standard deviation rso is equal to 0.13 V. In addition, the ln(I0/T2) vs. 1/T plot yields the effective Richardson constant of 1.47  102 A cm2 K2 for the Al/NPB/Si diode which is lower than the known value of 32 A cm2 K2 for Si. This deviation is attributed to the inhomogeneous barrier heights and potential fluctuations at the contact interface that consists of low and high barrier areas. The modified Richardson plot shows a straight line relationship between lnðJs=T2Þ  ðq2r2 so=2k2T2Þ vs. 1000/T, and gives a value of A* = 30.1 A cm2 K2.
    Relation: Microelectronic Engineering, 88(3), 287-292
    Appears in Collections:[Graduate School and Department of Electronic Engineering ] Periodical Articles

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