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    Please use this identifier to cite or link to this item: http://ir.lib.ksu.edu.tw/handle/987654321/10760


    Title: Effect of nitrogen doping on nanomechanical and surface properties of silicon film
    Authors: Te-Hua Fang
    Win-Jin Chang(張文進)
    Shao-Hui Kang
    Jia-Hung Liou
    Contributor: 圖書資訊館
    Keywords: Nitrogen ion implantation
    Nanomechanical properties
    Atomic force microscopy
    Nanoindentation
    Date: 2009
    Issue Date: 2010-09-03 14:13:42 (UTC+8)
    Abstract: The effect of nitrogen ion implantation on the nanomechanical properties of single crystal Si was evaluated
    by means of a conventional Vickers indentation and nanoindentation tests. The images of Si surfaces
    before and after nitrogen implantation were observed and their average surface roughnesses were measured
    by an atomic force microscope (AFM), while the changes in the morphology and microstructure of
    the single crystal Si by N implantation were examined by field emission scanning electron microscope
    (SEM) and X-ray diffractometer (XRD). In addition, the hydrophilic/hydrophobic surface property of
    the N-doping Si film was determined from the measurement of water contact angle by the sessile drop
    technique. Furthermore, the effects of the doping energy on the surface contact angle and the surface
    roughness and the Vickers hardness of the film are also investigated.
    Relation: Current Applied Physics
    Appears in Collections:[機械工程系所] 期刊論文

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